This chemical is primarily used in the field of organic synthesis, particularly as a photoremovable protecting group for carboxylic acids and other functional groups. Its fluorenyl group allows for efficient deprotection under UV light, making it valuable in photolithography and the development of light-sensitive materials. Additionally, it finds application in peptide synthesis, where it helps protect specific amino acids during the formation of peptide bonds. Its stability under various reaction conditions and ease of removal make it a versatile tool in advanced chemical research and material science.