2,2,2-Triphenylacetophenone

≥99%

Reagent Code: #115068
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CAS Number 466-37-5

science Other reagents with same CAS 466-37-5

blur_circular Chemical Specifications

scatter_plot Molecular Information
Weight 348.45 g/mol
Formula C₂₆H₂₀O
badge Registry Numbers
MDL Number MFCD00004762
thermostat Physical Properties
Melting Point 182-185°C
inventory_2 Storage & Handling
Storage room temperature

description Product Description

Used primarily as a photoinitiator in UV-curable coatings, inks, and adhesives. It facilitates the rapid polymerization process when exposed to ultraviolet light, making it essential in industries requiring fast-drying and durable finishes. Additionally, it is employed in the production of optical materials and photoresists for microelectronics, where precise and controlled curing is critical. Its ability to generate free radicals under UV exposure also makes it suitable for advanced research in photochemistry and material science.

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Test Parameter Specification
Appearance White to almost white powder to crystal
Purity (%) 99-100%
Melting Point (°C) 182.0-185.0
Infrared Spectrum Conforms To Structure

shopping_cart Available Sizes & Pricing

Size Availability Unit Price Quantity
inventory 5g
10-20 days ฿3,360.00
inventory 1g
10-20 days ฿960.00

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2,2,2-Triphenylacetophenone
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Used primarily as a photoinitiator in UV-curable coatings, inks, and adhesives. It facilitates the rapid polymerization process when exposed to ultraviolet light, making it essential in industries requiring fast-drying and durable finishes. Additionally, it is employed in the production of optical materials and photoresists for microelectronics, where precise and controlled curing is critical. Its ability to generate free radicals under UV exposure also makes it suitable for advanced research in photoche

Used primarily as a photoinitiator in UV-curable coatings, inks, and adhesives. It facilitates the rapid polymerization process when exposed to ultraviolet light, making it essential in industries requiring fast-drying and durable finishes. Additionally, it is employed in the production of optical materials and photoresists for microelectronics, where precise and controlled curing is critical. Its ability to generate free radicals under UV exposure also makes it suitable for advanced research in photochemistry and material science.

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