Used as a highly efficient photoinitiator in UV-curable systems, particularly in advanced lithography and high-resolution printing inks. Its strong absorption in the deep UV range enables rapid polymerization under short-wavelength irradiation, making it suitable for semiconductor manufacturing and micro-patterning applications. Exhibits excellent thermal stability and solubility in polar monomers, which enhances formulation flexibility in adhesives, coatings, and electronic encapsulants. The fluorinated structure contributes to improved transparency and reduced light scattering in thin films, critical for precision optical applications.