4-methyl-5,8,10-triazabicyclo[4.4.0]deca-2,4,11-triene-7,9-dione

≥95%

Reagent Code: #209982
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CAS Number 2499-96-9

science Other reagents with same CAS 2499-96-9

blur_circular Chemical Specifications

scatter_plot Molecular Information
Weight 177.16 g/mol
Formula C₈H₇N₃O₂
thermostat Physical Properties
Melting Point >370℃
inventory_2 Storage & Handling
Density 1.354±0.06 g/cm3(Predicted)
Storage 2-8℃, dry

description Product Description

Used primarily as a photoinitiator in UV-curable formulations, this compound plays a key role in polymer chemistry. It is especially effective in free-radical polymerization processes triggered by ultraviolet light. Common applications include inks, coatings, adhesives, and dental materials where rapid curing under UV exposure is required. Its structure allows for efficient radical generation, promoting fast and strong cross-linking of monomers and oligomers. It is often selected for systems needing high reactivity and good stability in storage.

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Size Availability Unit Price Quantity
inventory 250mg
10-20 days ฿8,550.00
inventory 1g
10-20 days ฿25,560.00
inventory 5g
10-20 days ฿109,440.00

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4-methyl-5,8,10-triazabicyclo[4.4.0]deca-2,4,11-triene-7,9-dione
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Used primarily as a photoinitiator in UV-curable formulations, this compound plays a key role in polymer chemistry. It is especially effective in free-radical polymerization processes triggered by ultraviolet light. Common applications include inks, coatings, adhesives, and dental materials where rapid curing under UV exposure is required. Its structure allows for efficient radical generation, promoting fast and strong cross-linking of monomers and oligomers. It is often selected for systems needing high

Used primarily as a photoinitiator in UV-curable formulations, this compound plays a key role in polymer chemistry. It is especially effective in free-radical polymerization processes triggered by ultraviolet light. Common applications include inks, coatings, adhesives, and dental materials where rapid curing under UV exposure is required. Its structure allows for efficient radical generation, promoting fast and strong cross-linking of monomers and oligomers. It is often selected for systems needing high reactivity and good stability in storage.

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