Used primarily as an intermediate in organic synthesis, this compound plays a key role in the preparation of photoacid generators. These generators are essential in photolithography processes, particularly in the production of semiconductor devices and advanced microelectronics. The compound’s nitro and methoxy functional groups contribute to its photoresponsiveness, making it suitable for applications in light-sensitive materials. It is also employed in the development of specialty polymers and resists used in high-resolution imaging and patterning technologies.