2-(2,4-dimethylphenyl)-2-oxoethyl 4-nitrobenzoate

≥95%

Reagent Code: #180085
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CAS Number 1327395-79-8

science Other reagents with same CAS 1327395-79-8

blur_circular Chemical Specifications

scatter_plot Molecular Information
Weight 313.31 g/mol
Formula C₁₇H₁₅NO₅
badge Registry Numbers
MDL Number MFCD07245893
inventory_2 Storage & Handling
Storage 2-8°C, sealed, dry, light-proof

description Product Description

Used primarily as a photoinitiator in UV-curable systems, this compound plays a key role in polymer chemistry. It is effective in free-radical polymerization reactions triggered by ultraviolet light, making it suitable for inks, coatings, and adhesives that require rapid curing under UV exposure. Its structure allows for efficient generation of radicals upon light absorption, promoting strong and fast crosslinking in thin films. Commonly found in industrial printing and electronic coatings where oxygen inhibition is minimal and deep cure is not required.

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Size Availability Unit Price Quantity
inventory 100mg
10-20 days ฿24,910.00

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2-(2,4-dimethylphenyl)-2-oxoethyl 4-nitrobenzoate
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Used primarily as a photoinitiator in UV-curable systems, this compound plays a key role in polymer chemistry. It is effective in free-radical polymerization reactions triggered by ultraviolet light, making it suitable for inks, coatings, and adhesives that require rapid curing under UV exposure. Its structure allows for efficient generation of radicals upon light absorption, promoting strong and fast crosslinking in thin films. Commonly found in industrial printing and electronic coatings where oxygen i

Used primarily as a photoinitiator in UV-curable systems, this compound plays a key role in polymer chemistry. It is effective in free-radical polymerization reactions triggered by ultraviolet light, making it suitable for inks, coatings, and adhesives that require rapid curing under UV exposure. Its structure allows for efficient generation of radicals upon light absorption, promoting strong and fast crosslinking in thin films. Commonly found in industrial printing and electronic coatings where oxygen inhibition is minimal and deep cure is not required.

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