2,4-Bis(4-biphenylyl)-6-chloro-1,3,5-triazine

≥99%

Reagent Code: #147731
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CAS Number 182918-13-4

science Other reagents with same CAS 182918-13-4

blur_circular Chemical Specifications

scatter_plot Molecular Information
Weight 419.91 g/mol
Formula C₂₇H₁₈ClN₃
badge Registry Numbers
MDL Number MFCD27979765
thermostat Physical Properties
Melting Point 217°C
inventory_2 Storage & Handling
Storage Room temperature, dry

description Product Description

Used as a photoinitiator in UV-curable systems, enabling rapid polymerization of inks, coatings, and adhesives upon UV exposure. Offers high efficiency in free radical generation, making it suitable for clear and pigmented formulations. Exhibits good thermal stability and low yellowing, ideal for high-performance printing and optical applications. Also employed in photoresist systems for electronics manufacturing due to its precise reactivity under controlled light conditions.

shopping_cart Available Sizes & Pricing

Size Availability Unit Price Quantity
inventory 200mg
10-20 days ฿180.00
inventory 1g
10-20 days ฿430.00
inventory 5g
10-20 days ฿1,120.00
inventory 25g
10-20 days ฿5,100.00

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2,4-Bis(4-biphenylyl)-6-chloro-1,3,5-triazine
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Used as a photoinitiator in UV-curable systems, enabling rapid polymerization of inks, coatings, and adhesives upon UV exposure. Offers high efficiency in free radical generation, making it suitable for clear and pigmented formulations. Exhibits good thermal stability and low yellowing, ideal for high-performance printing and optical applications. Also employed in photoresist systems for electronics manufacturing due to its precise reactivity under controlled light conditions.

Used as a photoinitiator in UV-curable systems, enabling rapid polymerization of inks, coatings, and adhesives upon UV exposure. Offers high efficiency in free radical generation, making it suitable for clear and pigmented formulations. Exhibits good thermal stability and low yellowing, ideal for high-performance printing and optical applications. Also employed in photoresist systems for electronics manufacturing due to its precise reactivity under controlled light conditions.

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