Benzoic acid,2-(2-naphthalenylcarbonyl)-

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Reagent Code: #141717
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CAS Number 38119-03-8

science Other reagents with same CAS 38119-03-8

blur_circular Chemical Specifications

scatter_plot Molecular Information
Weight 276.2861 g/mol
Formula C₁₈H₁₂O₃
thermostat Physical Properties
Melting Point 166 °C
Boiling Point 525.8±33.0 °C(Predicted)
inventory_2 Storage & Handling
Density 1.289±0.06 g/cm3(Predicted)
Storage 2-8°C

description Product Description

Used primarily as a photoinitiator in UV-curable inks, coatings, and adhesives. It absorbs ultraviolet light to generate free radicals that initiate polymerization, enabling fast curing under UV exposure. Commonly found in printing inks for packaging and industrial coatings where rapid drying and strong film formation are required. Also utilized in some specialty polymers to enhance light sensitivity during manufacturing processes. Its high absorption in the UV range makes it effective in thin-film applications.

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Size Availability Unit Price Quantity
inventory 100mg
10-20 days ฿28,800.00
inventory 250mg
10-20 days ฿48,000.00
inventory 1g
10-20 days ฿104,000.00

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Benzoic acid,2-(2-naphthalenylcarbonyl)-
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Used primarily as a photoinitiator in UV-curable inks, coatings, and adhesives. It absorbs ultraviolet light to generate free radicals that initiate polymerization, enabling fast curing under UV exposure. Commonly found in printing inks for packaging and industrial coatings where rapid drying and strong film formation are required. Also utilized in some specialty polymers to enhance light sensitivity during manufacturing processes. Its high absorption in the UV range makes it effective in thin-film appli

Used primarily as a photoinitiator in UV-curable inks, coatings, and adhesives. It absorbs ultraviolet light to generate free radicals that initiate polymerization, enabling fast curing under UV exposure. Commonly found in printing inks for packaging and industrial coatings where rapid drying and strong film formation are required. Also utilized in some specialty polymers to enhance light sensitivity during manufacturing processes. Its high absorption in the UV range makes it effective in thin-film applications.

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