2,4-Bis(4-bromophenyl)-6-phenyl-1,3,5-triazine

98%

Reagent Code: #141486
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CAS Number 137726-53-5

science Other reagents with same CAS 137726-53-5

blur_circular Chemical Specifications

scatter_plot Molecular Information
Weight 467.16 g/mol
Formula C₂₁H₁₃Br₂N₃
badge Registry Numbers
MDL Number MFCD32709424
thermostat Physical Properties
Melting Point 259-261 °C(Solv: benzene (71-43-2))
Boiling Point 604.2±65.0 °C(Predicted)
inventory_2 Storage & Handling
Density 1.571±0.06 g/cm3(Predicted)
Storage Room temperature, inert gas

description Product Description

Used primarily as a photoinitiator in UV-curable systems. It is effective in inks, coatings, and adhesives that require rapid curing upon exposure to ultraviolet light. Offers good thermal stability and promotes strong curing under low-intensity UV sources. Commonly used in printing inks and electronic materials where precise and fast polymerization is needed. Also found in some photoresists and imaging systems due to its sensitivity and efficiency in free radical generation.

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Size Availability Unit Price Quantity
inventory 100mg
10-20 days ฿3,750.00
inventory 250mg
10-20 days ฿5,560.00
inventory 1g
10-20 days ฿15,440.00

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2,4-Bis(4-bromophenyl)-6-phenyl-1,3,5-triazine
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Used primarily as a photoinitiator in UV-curable systems. It is effective in inks, coatings, and adhesives that require rapid curing upon exposure to ultraviolet light. Offers good thermal stability and promotes strong curing under low-intensity UV sources. Commonly used in printing inks and electronic materials where precise and fast polymerization is needed. Also found in some photoresists and imaging systems due to its sensitivity and efficiency in free radical generation.

Used primarily as a photoinitiator in UV-curable systems. It is effective in inks, coatings, and adhesives that require rapid curing upon exposure to ultraviolet light. Offers good thermal stability and promotes strong curing under low-intensity UV sources. Commonly used in printing inks and electronic materials where precise and fast polymerization is needed. Also found in some photoresists and imaging systems due to its sensitivity and efficiency in free radical generation.

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