Used primarily as a photoacid generator (PAG) in photoresist formulations for semiconductor manufacturing. It generates strong acids upon exposure to ultraviolet (UV) light, facilitating the patterning process in lithography. This chemical is crucial in creating high-resolution microstructures on silicon wafers, essential for producing advanced electronic devices. Its high sensitivity and efficiency make it suitable for deep UV and extreme UV lithography applications. Additionally, it is employed in the production of printed circuit boards (PCBs) and other microelectronic components, ensuring precise and reliable fabrication processes.