Used primarily as a photoacid generator (PAG) in photoresist formulations for the semiconductor industry. It plays a critical role in lithography processes, where it generates acid upon exposure to ultraviolet (UV) light, enabling the patterning of microelectronic components. Its stability and efficiency make it suitable for advanced manufacturing of integrated circuits and microchips. Additionally, it finds application in the production of high-resolution displays and other nanotechnology-based devices.