This chemical is primarily used as a photoacid generator (PAG) in advanced photoresist formulations for the semiconductor industry. When exposed to ultraviolet (UV) light, it releases strong acids that catalyze the chemical changes needed to create precise patterns on silicon wafers during the lithography process. Its high sensitivity and efficiency make it suitable for manufacturing microchips and other electronic components with nanoscale precision. Additionally, it is valued for its thermal stability and compatibility with various resist materials, ensuring consistent performance in high-resolution imaging applications.