Widely used as a photoacid generator (PAG) in photoresist formulations for semiconductor manufacturing. Enables precise patterning of microelectronic components during UV lithography processes by generating acid upon light exposure.

Utilized in polymer chemistry as a photoinitiator for cationic polymerization reactions, such as those involving epoxides and vinyl ethers. Enables production of specialized polymers with tailored properties.

Employed in organic synthesis as a photochemical reagent for introducing functional groups. Supports creation of complex molecular structures in pharmaceutical and fine chemical research.

Applied in photochemical research for studying light-induced reactions, providing insights into mechanisms and kinetics.

Contributes to advanced materials science for surface modification and in the development of light-sensitive components for electronics, displays, and nanotechnology.