This compound is widely used as a photoacid generator (PAG) in photolithography processes, particularly in the manufacturing of semiconductors and microelectronics. Upon exposure to ultraviolet (UV) light, it releases acids that catalyze the cross-linking or decomposition of photoresists, enabling precise patterning on silicon wafers. Its efficiency and stability make it a key component in advanced photoresist formulations for high-resolution imaging. Additionally, it finds applications in the synthesis of organic compounds, where it acts as a catalyst or reagent in various chemical reactions, including polymerization and functional group transformations. Its unique properties also make it suitable for research in material science and nanotechnology.