Used primarily as a photoacid generator (PAG) in photoresist formulations for semiconductor manufacturing. It generates strong acids upon exposure to UV light, facilitating the patterning process in lithography. This chemical is crucial for creating high-resolution microstructures in electronic devices. Its stability and efficiency make it suitable for advanced technology nodes in the production of integrated circuits. Additionally, it finds applications in the development of advanced materials and coatings where precise acid generation is required.