Used primarily as a photoacid generator (PAG) in photolithography processes within the semiconductor industry. It generates acid upon exposure to ultraviolet (UV) light, which is essential for patterning microelectronic devices. Its high sensitivity and efficiency make it suitable for advanced photoresist formulations. Additionally, it is employed in the production of high-resolution displays and printed circuit boards. The compound’s stability and performance under UV exposure contribute to its effectiveness in fine-scale manufacturing processes.