Widely used as a photoacid generator in photolithography processes within the semiconductor industry. It plays a critical role in the production of microchips and other electronic components by generating acid upon exposure to UV light, which helps in patterning and etching silicon wafers. Additionally, it is employed in advanced materials science for creating high-resolution images in photoresist coatings, enabling precise fabrication of nanoscale structures. Its efficiency in generating strong acids under light exposure makes it valuable in various high-tech manufacturing applications.