Used extensively in photopolymerization processes, it serves as a highly efficient photoacid generator (PAG) in the production of advanced materials. Its application is crucial in the manufacturing of photoresists for semiconductor and microelectronics industries, where it helps in creating precise patterns on silicon wafers. Additionally, it is employed in the synthesis of specialty polymers and coatings, enhancing their properties through controlled curing mechanisms. The compound also finds use in organic synthesis, particularly in facilitating iodonium-based reactions, which are pivotal in constructing complex molecular architectures. Its stability and reactivity under light exposure make it a valuable component in various high-tech industrial applications.