This chemical is primarily used as a photoacid generator (PAG) in advanced photolithography processes, particularly in the manufacturing of semiconductors and microelectronics. Upon exposure to ultraviolet (UV) light, it releases strong acids that catalyze the cross-linking or decomposition of photoresist materials, enabling precise patterning on silicon wafers. Its high sensitivity and efficiency make it suitable for producing fine features required in modern integrated circuits. Additionally, it is employed in the development of high-resolution imaging systems and advanced materials for nanotechnology applications.