This chemical is primarily used as a photoacid generator (PAG) in advanced photoresist formulations for semiconductor manufacturing. It plays a critical role in photolithography processes, where it generates acid upon exposure to ultraviolet (UV) light, enabling the patterning of microelectronic components on silicon wafers. Its high sensitivity and efficiency make it suitable for deep UV (DUV) and extreme UV (EUV) lithography, which are essential for producing smaller and more complex integrated circuits. Additionally, it is utilized in the fabrication of high-resolution displays and other microelectronic devices, contributing to advancements in electronics miniaturization and performance.