Used as a precursor in the synthesis of tin-containing materials, particularly in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. It plays a key role in the production of thin films for semiconductors and electronic devices, where precise control over material composition and thickness is critical. Additionally, it is employed in the development of advanced coatings and nanomaterials, contributing to innovations in optics, energy storage, and catalysis. Its reactivity with various substrates makes it valuable in research and industrial applications requiring high-purity tin-based compounds.