Tetraethylsilane is primarily used in the semiconductor industry as a precursor for depositing silicon-containing thin films. It plays a crucial role in chemical vapor deposition (CVD) processes, where it helps create silicon dioxide or silicon nitride layers on substrates. These layers are essential for insulating and protecting electronic components in integrated circuits. Additionally, it is employed in the production of optical fibers, where it contributes to the formation of high-purity glass coatings. Its application extends to research and development in material science, particularly in synthesizing silicon-based polymers and coatings with specific properties.