This chemical is primarily used in the production of silicon nitride films, which are crucial in semiconductor manufacturing. It serves as a precursor in chemical vapor deposition (CVD) processes to create thin, high-quality silicon nitride layers on substrates. These layers are essential for insulating and protecting electronic components in integrated circuits. Additionally, it finds application in the synthesis of organosilicon compounds, which are utilized in various industrial and research settings. Its role in forming protective coatings also extends to enhancing the durability and performance of materials in harsh environments.