This chemical is widely utilized in the production of thin films and coatings, particularly in the field of materials science. It serves as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes, enabling the creation of high-purity aluminum oxide films. These films are essential in manufacturing semiconductors, optical devices, and protective coatings for various surfaces. Additionally, it is employed in the synthesis of catalysts and as a cross-linking agent in polymer chemistry, enhancing the thermal and mechanical properties of materials. Its versatility makes it valuable in advanced industrial and research applications.