Tris(dimethylamino)antimony is a specialty organoantimony compound used primarily as a volatile precursor in chemical vapor deposition (CVD) and metal-organic CVD (MOCVD) processes for depositing high-purity antimony-containing thin films, such as in semiconductor materials, photovoltaic devices, and electronic coatings requiring specific electrical properties. It serves as an intermediate for synthesizing complex antimony compounds. Additionally, it functions as a catalyst in advanced organic synthesis, particularly in hydroamination and polymerization reactions, facilitating carbon-nitrogen bond formation essential for producing amines and other nitrogen-containing compounds. Its strong nucleophilic properties make it valuable in specialty chemical manufacturing and research & development of novel antimony-based reagents and materials.