Used primarily in research as a reagent for the synthesis of bismuth-containing compounds. It serves as a precursor in metal-organic chemical vapor deposition (MOCVD) for depositing bismuth-based thin films, which are applied in semiconductor and optoelectronic materials. Its high reactivity makes it suitable for generating organobismuth complexes with potential catalytic or medicinal properties. Due to thermal instability, it is handled under controlled conditions for specialized laboratory applications.