Used as a precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes to create strontium-containing thin films. These films are essential in the fabrication of advanced electronic materials, including high-dielectric-constant (high-k) materials and ferroelectric layers used in capacitors and memory devices. Its volatility and thermal stability make it suitable for depositing uniform, high-purity strontium oxide or strontium titanate films at relatively low temperatures. Also employed in research settings for synthesizing strontium-based nanomaterials and in doping applications for phosphors and superconductors.