Used primarily as a precursor in chemical vapor deposition (CVD) processes for depositing platinum-containing thin films. These films serve in microelectronics as conductive layers, especially in semiconductor devices and capacitors, due to platinum’s excellent stability and conductivity. The compound’s volatility and thermal decomposition characteristics make it suitable for forming high-purity platinum films at relatively low temperatures. It is also explored in the synthesis of platinum-based catalysts and in research settings for organoplatinum chemistry.