Used primarily in the semiconductor industry as a precursor for germanium-containing thin films through chemical vapor deposition (CVD). Its organogermanium structure allows for lower deposition temperatures compared to inorganic germanium sources, making it suitable for temperature-sensitive applications. Also investigated in the synthesis of specialty organometallic compounds for research in materials science, particularly in developing germanium-based polymers and hybrid organic-inorganic materials. Shows potential in optoelectronic applications due to the electronic properties of germanium when incorporated into layered structures.