Used as a precursor in the synthesis of dysprosium-containing materials for optical and magnetic applications. Commonly employed in metal-organic chemical vapor deposition (MOCVD) to fabricate thin films for advanced electronic and photonic devices. Its volatility and thermal stability make it suitable for depositing dysprosium oxide layers, which are useful in high-k dielectrics and magnetic storage media. Also utilized in research settings for doping luminescent materials and in the development of catalysts for organic transformations.