Boron-11B oxide

99 atom % 11B

Reagent Code: #149676
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CAS Number 77704-22-4

science Other reagents with same CAS 77704-22-4

blur_circular Chemical Specifications

scatter_plot Molecular Information
Weight 70.02 g/mol
Formula CHB₂O₃
badge Registry Numbers
MDL Number MFCD00198017
thermostat Physical Properties
Melting Point 450 °C (lit.)
inventory_2 Storage & Handling
Density 2.474 g/mL at 25 °C (lit.)
Storage Room temperature

description Product Description

Used in nuclear reactors where low neutron absorption is required due to its low absorption cross-section for thermal neutrons. It serves in radiation shielding and structural components, helping maintain neutron flux without interference. Also employed in semiconductor manufacturing as a dopant source for producing p-type silicon materials. Applied in specialty glass and ceramic formulations to enhance thermal and chemical resistance. Utilized in analytical chemistry as a tracer in isotopic studies owing to its non-radioactive and stable nature.

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Test Parameter Specification
Appearance White Powder or Granular Powder
Isotopic Assay (Atom % D) 98.5-100
Infrared Spectrum Conforms to Structure
NMR Conforms to Structure

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Size Availability Unit Price Quantity
inventory 1g
10-20 days ฿6,600.00

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Boron-11B oxide
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Used in nuclear reactors where low neutron absorption is required due to its low absorption cross-section for thermal neutrons. It serves in radiation shielding and structural components, helping maintain neutron flux without interference. Also employed in semiconductor manufacturing as a dopant source for producing p-type silicon materials. Applied in specialty glass and ceramic formulations to enhance thermal and chemical resistance. Utilized in analytical chemistry as a tracer in isotopic studies owin

Used in nuclear reactors where low neutron absorption is required due to its low absorption cross-section for thermal neutrons. It serves in radiation shielding and structural components, helping maintain neutron flux without interference. Also employed in semiconductor manufacturing as a dopant source for producing p-type silicon materials. Applied in specialty glass and ceramic formulations to enhance thermal and chemical resistance. Utilized in analytical chemistry as a tracer in isotopic studies owing to its non-radioactive and stable nature.

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