Used as a catalyst in organic synthesis reactions, particularly in fluorination processes where selective introduction of fluorine atoms is required. It also serves in the production of specialty fluorides and metal alloys due to its reducing properties. In materials science, it functions as a precursor for depositing titanium-containing thin films via chemical vapor deposition (CVD), useful in semiconductor and coating industries. Additionally, it finds use in research laboratories for studying low-valent titanium chemistry and its reactivity with various ligands.