Used as a photoacid generator in advanced photoresist formulations for semiconductor manufacturing, enabling high-resolution patterning in photolithography. Upon exposure to UV or deep UV light, it releases strong acid that catalyzes chemical changes in the resist, crucial for creating microelectronic circuits. Also employed in organic synthesis as a mild oxidizing agent and arylating agent, particularly in reactions requiring iodonium-based transfer of aryl groups. Its thermal stability and controlled reactivity make it suitable for use in coatings, imaging systems, and cationic polymerization processes.