Used primarily as an intermediate in the synthesis of photoacid generators (PAGs) for advanced photolithography processes in semiconductor manufacturing. Its bromomethyl group readily undergoes substitution reactions, making it valuable for introducing nitro-substituted aromatic moieties into larger molecules. It is also employed in the preparation of light-sensitive compounds for photoresists, where controlled acid release upon UV exposure is required. Additionally, it serves as a building block in organic synthesis for pharmaceuticals and agrochemicals where nitroaromatic systems are needed.