Used primarily in advanced polymer synthesis, this compound acts as a monomer for creating fluorinated polyarylethers and other high-performance polymers. Its unique rigid cyclic structure enhances thermal stability and chemical resistance in the resulting materials. These polymers are suitable for aerospace, electronics, and semiconductor applications where durability under extreme conditions is required.

The compound also finds use in electronic materials, particularly in the development of dielectric thin films for microelectronics due to its low dielectric constant and excellent insulating properties. Additionally, it serves as a building block in the fabrication of optoelectronic devices and specialty coatings requiring low surface energy and high transparency.

Its fluorinated aromatic framework makes it valuable in research focused on membrane technologies for gas separation, especially in environments demanding resistance to aggressive chemicals.