Hydrofluoric acid
Electronic grade, 49wt. % in H2O, 99.99998%metals basis
blur_circular Chemical Specifications
description Product Description
Hydrofluoric acid is widely used in the industrial sector for etching and polishing glass, including in the production of decorative glassware, mirrors, and optical components. It is also employed in the semiconductor industry to clean and etch silicon wafers, crucial for manufacturing microelectronics and integrated circuits. In the petroleum industry, it serves as a catalyst in alkylation processes to produce high-octane gasoline. Additionally, it is utilized in the removal of rust and stains from metals, particularly stainless steel, due to its ability to dissolve metal oxides. In chemical synthesis, it is used to produce fluorinated compounds, including refrigerants and pharmaceuticals. However, its handling requires extreme caution due to its highly corrosive and toxic nature.
format_list_bulleted Product Specification
| Test Parameter | Specification |
|---|---|
| As | 0-50 ppb |
| Assay | 48-50% |
| AU | 0-20 ppb |
| B | 0-20 ppb |
| Barium (Ba) | 0-0.1 ppm |
| BI | 0-20 ppb |
| Cadmium (Cd) | 0-0.05 ppm |
| Cobalt (Co) | 0-20 ppb |
| Copper (Cu) | 0-20 ppb |
| CR | 0-20 ppb |
| Fe | 0-100 ppb |
| GA | 0-20 ppb |
| Magnesium (Mg) | 0-20 ppb |
| MN | 0-0.02 ppm |
| MO | 0-0.1 ppm |
| NA | 0-0.2 ppm |
| NI | 0-0.05 ppm |
| Pb | 0-0.05 ppm |
| PT | 0-100 ppb |
| SN | 0-20 ppb |
| TI | 0-100 ppb |
| Zn | 0-0.05 ppm |
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