Used in polymer chemistry as a functional monomer to introduce trifluoromethylsulfonamido groups into copolymers, enhancing chemical resistance, thermal stability, and hydrophobicity. Commonly applied in specialty coatings and advanced materials where durability and performance under harsh conditions are required. Also utilized in developing stimuli-responsive polymers and as a building block in lithographic materials for semiconductor manufacturing due to its etch resistance and solubility control properties.