This mixture of anions—fluoride, chloride, and sulfate—finds use in industrial etching and cleaning processes, particularly in semiconductor manufacturing and metal surface treatment. The fluoride component is effective in etching silica and silicate materials, making it valuable in microfabrication. Chloride ions contribute to the removal of metal oxides from surfaces, enhancing cleaning efficiency in pickling operations for stainless steel and other alloys. Sulfate ions often act as proton donors or stabilizers in acidic formulations, supporting the overall reactivity and conductivity of the solution. Together, these anions can be tailored in concentration to optimize material removal rates, surface passivation, or catalytic activity in chemical processing environments. Their combined presence may also be used in specific electrolytes for electrochemical applications where controlled ion mobility and reactivity are required.