2,2'-((((((9H-Fluorene-9,9-diyl)bis(4,1-phenylene))bis(oxy))bis(ethane-2,1-diyl))bis(oxy))bis(methylene))bis(oxirane)

98%

Reagent Code: #197869
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CAS Number 259881-39-5

science Other reagents with same CAS 259881-39-5

blur_circular Chemical Specifications

scatter_plot Molecular Information
Weight 550.64 g/mol
Formula C₃₅H₃₄O₆
badge Registry Numbers
MDL Number MFCD12911673
inventory_2 Storage & Handling
Storage 2-8°C, sealed, dry

description Product Description

Used as a reactive diluent and crosslinking agent in high-performance epoxy resin systems. Provides improved thermal stability and mechanical strength to composites. Commonly applied in advanced electronics encapsulation, aerospace materials, and high-temperature adhesives due to its ability to form dense, rigid networks upon curing. Also utilized in lithography and microelectronics as a component in photoresist formulations. Shows good compatibility with various hardeners and enhances glass transition temperature (Tg) of cured resins.

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Size Availability Unit Price Quantity
inventory 5g
10-20 days ฿1,140.00
inventory 25g
10-20 days ฿3,880.00
inventory 100g
10-20 days ฿14,450.00

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2,2'-((((((9H-Fluorene-9,9-diyl)bis(4,1-phenylene))bis(oxy))bis(ethane-2,1-diyl))bis(oxy))bis(methylene))bis(oxirane)
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Used as a reactive diluent and crosslinking agent in high-performance epoxy resin systems. Provides improved thermal stability and mechanical strength to composites. Commonly applied in advanced electronics encapsulation, aerospace materials, and high-temperature adhesives due to its ability to form dense, rigid networks upon curing. Also utilized in lithography and microelectronics as a component in photoresist formulations. Shows good compatibility with various hardeners and enhances glass transition temp
Used as a reactive diluent and crosslinking agent in high-performance epoxy resin systems. Provides improved thermal stability and mechanical strength to composites. Commonly applied in advanced electronics encapsulation, aerospace materials, and high-temperature adhesives due to its ability to form dense, rigid networks upon curing. Also utilized in lithography and microelectronics as a component in photoresist formulations. Shows good compatibility with various hardeners and enhances glass transition temperature (Tg) of cured resins.
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