Hexamethoxydisilane

95%

Reagent Code: #88487
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CAS Number 5851-07-0

science Other reagents with same CAS 5851-07-0

blur_circular Chemical Specifications

scatter_plot Molecular Information
Weight 242.37 g/mol
Formula C₆H₁₈O₆Si₂
thermostat Physical Properties
Boiling Point 98 °C /20 mmHg
inventory_2 Storage & Handling
Storage 2-8°C, sealed, dry

description Product Description

Used primarily in the production of silicon-based materials, it serves as a key precursor in the synthesis of silica gels and other silicon compounds. Its application extends to the semiconductor industry, where it is utilized in chemical vapor deposition (CVD) processes to create thin films essential for electronic devices. Additionally, it plays a role in the development of coatings and adhesives, enhancing their durability and performance. In research, it is employed to modify surfaces, improving their properties for specific industrial applications.

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Size Availability Unit Price Quantity
inventory 5g
10-20 days ฿28,800.00

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Hexamethoxydisilane
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Used primarily in the production of silicon-based materials, it serves as a key precursor in the synthesis of silica gels and other silicon compounds. Its application extends to the semiconductor industry, where it is utilized in chemical vapor deposition (CVD) processes to create thin films essential for electronic devices. Additionally, it plays a role in the development of coatings and adhesives, enhancing their durability and performance. In research, it is employed to modify surfaces, improving their properties for specific industrial applications.
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