Hexamethyldisilane is widely used in the semiconductor industry as a silicon source in chemical vapor deposition (CVD) processes. It helps in the formation of thin silicon films on substrates, which are essential for manufacturing integrated circuits and microelectronics.

In organic synthesis, it serves as a silylating agent, protecting hydroxyl groups during complex reactions. This ensures selective transformations without unwanted side reactions.

Additionally, it is employed in the production of silicone polymers and resins, where it acts as a precursor. These materials are utilized in coatings, adhesives, and sealants due to their thermal stability and water resistance.

In research, hexamethyldisilane is used as a reducing agent in certain chemical reactions, facilitating the conversion of metal oxides to pure metals. Its applications span across industries, making it a versatile compound in both industrial and laboratory settings.