Widely used in the semiconductor industry as a precursor for depositing silicon-containing thin films through chemical vapor deposition (CVD) processes. It plays a critical role in the fabrication of microelectronic devices, ensuring high-quality silicon layers with precise control over thickness and uniformity. Additionally, it is employed in the production of advanced materials, such as silicon carbide coatings, which enhance the durability and performance of components in high-temperature and corrosive environments. Its application extends to research and development in nanotechnology, where it contributes to the creation of innovative nanostructures and devices.