cyclohexane-1,2-diyldimethanediyl dimethanesulfonate
≥95%
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Used primarily as a crosslinking agent in polymer chemistry, this compound enables the formation of thermally stable and mechanically robust networks in specialty resins. It is particularly effective in cationic polymerization processes, where it contributes to the development of high-performance coatings and encapsulants. Its bifunctional sulfonate ester structure allows for efficient linking of reactive monomers, enhancing the glass transition temperature and chemical resistance of the resulting polymers. It finds niche use in electronic materials, such as in photoresists and dielectric layers, due to its ability to support fine patterning and thermal stability during semiconductor processing. Additionally, it serves as a building block in the synthesis of advanced organic frameworks where controlled molecular architecture is required.
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