Used as a precursor in organometallic synthesis, particularly in the preparation of cobalt-containing catalysts. It serves in vapor deposition processes for thin film applications, especially in semiconductor and electronic material fabrication. The compound acts as a source of reactive cobalt species in the synthesis of advanced materials, including magnetic and conductive coatings. Its high volatility and thermal stability make it suitable for use in chemical vapor deposition (CVD) and atomic layer deposition (ALD) techniques. Also employed in research settings for the development of novel cobalt complexes with tailored reactivity and catalytic properties.