Used primarily in the field of materials science, this compound serves as a precursor for the deposition of cobalt-containing thin films through chemical vapor deposition (CVD) and atomic layer deposition (ALD) techniques. These films are critical in the manufacturing of semiconductors and electronic devices, where they contribute to the development of magnetic and conductive layers. Additionally, it finds application in catalysis, particularly in organic synthesis reactions, where it facilitates various chemical transformations. Its role in research and development is also notable, as it aids in the study of coordination chemistry and the behavior of metal complexes in different environments.