Used as a key intermediate in the synthesis of high-performance polymers, particularly in the production of fluorinated polyimides and polyesters. Its unique structure, featuring both a trifluoromethyl group and a carboxylic acid functionality, enhances thermal stability, chemical resistance, and optical clarity in the resulting materials. Commonly applied in advanced electronic devices, such as flexible printed circuits and display technologies, due to improved dielectric properties and moisture resistance. Also utilized in specialty coatings requiring durability under harsh environmental conditions.