As solution
1000µg/ml,10% HNO3
Reagent
Code: #138966
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2~8 ℃
description Product Description
Used as a precursor in the synthesis of gallium arsenide (GaAs), a semiconductor material widely applied in high-speed electronics, infrared light-emitting diodes (LEDs), laser diodes, and photovoltaic cells. Also employed in doping silicon for n-type semiconductors and in the production of compound semiconductors for microwave frequency devices and optoelectronic components. Its role in metalorganic vapor phase epitaxy (MOVPE) enables precise layering of arsenic-containing films in advanced electronic and photonic devices.
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