Tetramethylammonium hydroxide solution

25% aqueous solution

Reagent Code: #78367
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Alias Tetramethylammonium hydroxide 25% solution; developer TMAH
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CAS Number 75-59-2

science Other reagents with same CAS 75-59-2

blur_circular Chemical Specifications

scatter_plot Molecular Information
Weight 91.15 g/mol
Formula C₄H₁₃NO
badge Registry Numbers
MDL Number MFCD00008280
thermostat Physical Properties
Melting Point °C
Boiling Point 110 °C
inventory_2 Storage & Handling
Density 1.016 g/mL at 25 °C
Storage room temperature

description Product Description

Tetramethylammonium hydroxide solution is widely used in the electronics industry as a developer in the photolithography process for manufacturing semiconductors and integrated circuits. It helps in creating precise patterns on silicon wafers by removing exposed photoresist layers, ensuring high-resolution microstructures.

In analytical chemistry, it serves as an ion-pairing reagent in liquid chromatography, enhancing the separation of complex mixtures. Additionally, it is utilized in the synthesis of organic compounds as a strong base or catalyst, particularly in reactions requiring controlled pH conditions.

The solution is also employed in the production of liquid crystal displays (LCDs) as an etchant for indium tin oxide (ITO) layers, contributing to the fabrication of transparent conductive coatings. Its role in these applications underscores its importance in advanced manufacturing and research processes.

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Test Parameter Specification
Assay 24-26
Refractive Index (n20D) 1.378-1.384
Appearance Colorless liquid

shopping_cart Available Sizes & Pricing

Size Availability Unit Price Quantity
inventory 5L
10-20 days ฿13,460.00
inventory 100ml
10-20 days ฿680.00
inventory 250ml
10-20 days ฿1,590.00
inventory 500ml
10-20 days ฿2,780.00

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Tetramethylammonium hydroxide solution
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Tetramethylammonium hydroxide solution is widely used in the electronics industry as a developer in the photolithography process for manufacturing semiconductors and integrated circuits. It helps in creating precise patterns on silicon wafers by removing exposed photoresist layers, ensuring high-resolution microstructures.

In analytical chemistry, it serves as an ion-pairing reagent in liquid chromatography, enhancing the separation of complex mixtures. Additionally, it is utilized in the synthesis

Tetramethylammonium hydroxide solution is widely used in the electronics industry as a developer in the photolithography process for manufacturing semiconductors and integrated circuits. It helps in creating precise patterns on silicon wafers by removing exposed photoresist layers, ensuring high-resolution microstructures.

In analytical chemistry, it serves as an ion-pairing reagent in liquid chromatography, enhancing the separation of complex mixtures. Additionally, it is utilized in the synthesis of organic compounds as a strong base or catalyst, particularly in reactions requiring controlled pH conditions.

The solution is also employed in the production of liquid crystal displays (LCDs) as an etchant for indium tin oxide (ITO) layers, contributing to the fabrication of transparent conductive coatings. Its role in these applications underscores its importance in advanced manufacturing and research processes.

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