Used as a developer in photolithography processes, especially in semiconductor manufacturing, where it selectively removes exposed regions of photoresist to create precise circuit patterns. Commonly employed in the production of microelectronics and integrated circuits due to its consistent performance and compatibility with thin-film technologies. Also utilized in organic synthesis as a strong base for deprotonation reactions and in analytical chemistry for sample preparation. Its aqueous solution form ensures easy handling and controlled reactivity in industrial and laboratory settings.