Used as a developer in photolithography processes, especially in semiconductor manufacturing, where it selectively removes exposed regions of photoresist with high precision. Commonly employed in microfabrication for etching and patterning due to its consistent performance and compatibility with silicon-based materials. Also utilized in organic synthesis as a strong base for deprotonation and elimination reactions. Its aqueous solution serves in analytical chemistry for sample preparation and as a phase-transfer catalyst in various chemical transformations, including alkylations.